Chemical vapor deposition

Chemical vapor deposition (CVD) is a widely used materials-processing technology. The majority of its applications involve applying solid thin-film coatings to surfaces, but it is also used to produce high-purity bulk materials and powders, as well as fabricating composite materials via infiltration techniques.
One of the earliest examples of a large-scale CVD application was a carbonyl process for refining of nicked, developed by Mond, Langer, and Quincke in 1890.
Many of the early applications involved refining or purification of metals and a limited number of non-metals by carbonyl or halide processes.
Other early applications involved deposition of coatings for wear and corrosion resistance, and the fabrication of structural shapes and components.
How it works
How it works
In simple terms, CVD involves flowing a precursor gas or gases into chamber containing one or more heated objects to be coated. Chemical reactions occur on and near the hot surfaces, resulting in the deposition of a thin film on the surface. This is accompanied by the production of chemical by-products that are exhausted out of the chamber along with unreacted precursor gases.
In general, CVD process is classified and categorized in various ways such as low and high temperature, low and high pressure,...

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